Investigating the Trimethylaluminium/Water ALD Process on Mesoporous Silica by In Situ Gravimetric Monitoring
A low amount of AlOx was successfully deposited on an unordered, mesoporous SiO2 powder using 1–3 ALD (Atomic Layer Deposition) cycles of trimethylaluminium and water.The process was realized in a self-built ALD setup featuring a microbalanceand a fixed particle bed.The reactor temperature was varied between 75, 120, and 200 °C.The self-l